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DIFFUSION AND ACTIVATION DURING RAPID THERMAL ANNEALING OF IMPLANTED BORON IN SILICON

Author(s):
Cowern, N.E.B.
Yallup, K.J.
Godfrey, D.J.
Hasko, D.G.
McMahon, R.A.
Ahmed, H.
Stobbs, W.M.
McPhail, D.S.
3 more
Publication title:
Rapid thermal processing : symposium held December 2-4, 1985, Boston, Massachusetts, U.S.A.
Title of ser.:
Materials Research Society symposium proceedings
Ser. no.:
52
Pub. Year:
1985
Page(from):
65
Page(to):
72
Pages:
8
Pub. info.:
Pittsburgh, Pa.: Materials Research Society
ISSN:
02729172
ISBN:
9780931837173 [0931837170]
Language:
English
Call no.:
M23500/52
Type:
Conference Proceedings

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