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*THE KINETICS AND MICROSTRUCTURE OF ION BEAM INDUCED CRYSTALLIZATION OF SILICON

Author(s):
Williams, J. S.
Brown, W. L.
Elliman, R. G.
Knoell, R. V.
Maher, D. M.
Seidel, T. E.
1 more
Publication title:
Ion beam processes in advanced electronic materials and device technology : symposium held April 15-18, 1985, San Francisco, California, U.S.A.
Title of ser.:
Materials Research Society symposium proceedings
Ser. no.:
45
Pub. date:
1985
Page(from):
79
Page(to):
90
Pages:
12
Pub. info.:
Pittsburgh, Pa.: Materials Research Society
ISSN:
02729172
ISBN:
9780931837104 [0931837103]
Language:
English
Call no.:
M23500/45
Type:
Conference Proceedings

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