THE EFFECT OF UNIAXIAL STRESS ON THE INFRARED ABSORPTION BANDS DUE TO THE OXYGEN DONOR IN SILICON
- Author(s):
- Publication title:
- Microscopic identification of electronic defects in semiconductors : symposium held April 15-18, 1985, San Francisco, California, U.S.A.
- Title of ser.:
- Materials Research Society symposium proceedings
- Ser. no.:
- 46
- Pub. Year:
- 1985
- Page(from):
- 257
- Page(to):
- 262
- Pages:
- 6
- Pub. info.:
- Pittsburgh, Pa.: Materials Research Society
- ISSN:
- 02729172
- ISBN:
- 9780931837111 [0931837111]
- Language:
- English
- Call no.:
- M23500/46
- Type:
- Conference Proceedings
Similar Items:
Materials Research Society |
Trans Tech Publications |
Materials Research Society |
SPIE - The International Society of Optical Engineering |
Materials Research Society |
9
Conference Proceedings
Theoretical studies on the structure for the core of oxygen thermal donors in silicon
Trans Tech Publications |
Materials Research Society |
MRS - Materials Research Society |
Materials Research Society |
Trans Tech Publications |
6
Conference Proceedings
UNIAXIAL STRESS AND ZEEMAN MEASUREMENTS ON THE 943 meV LUMINESCENCE BAND IN SILICON
Materials Research Society |
Materials Research Society |