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THE INFLUENCE OF IMPLANTATION CONDITIONS AND TARGET ORIENTATION IN HIGH DOSE IMPLANTATION OF A1+ INTO Si

Author(s):
Namavar, F.
Budnick, J. I
Fasihuddin, A.
Hayden, H. C.
Pease, D. A.
Otter, F. A.
Patarini, V.
2 more
Publication title:
Ion implantation and ion beam processing of materials : symposium held November 1983 in Boston, Massachusetts, U.S.A.
Title of ser.:
Materials Research Society symposium proceedings
Ser. no.:
27
Pub. Year:
1984
Page(from):
347
Page(to):
352
Pages:
6
Pub. info.:
New York: North-Holland
ISSN:
02729172
ISBN:
9780444008695 [0444008691]
Language:
English
Call no.:
M23500/27
Type:
Conference Proceedings

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