AMORPHOUS PHASE FORMATION AND RECRYSTALLIZATION IN ION-IMPLANTED SILICIDES
- Author(s):
- Publication title:
- Ion implantation and ion beam processing of materials : symposium held November 1983 in Boston, Massachusetts, U.S.A.
- Title of ser.:
- Materials Research Society symposium proceedings
- Ser. no.:
- 27
- Pub. Year:
- 1984
- Page(from):
- 145
- Page(to):
- 150
- Pages:
- 6
- Pub. info.:
- New York: North-Holland
- ISSN:
- 02729172
- ISBN:
- 9780444008695 [0444008691]
- Language:
- English
- Call no.:
- M23500/27
- Type:
- Conference Proceedings
Similar Items:
Materials Research Society |
North-Holland |
Materials Research Society |
8
Conference Proceedings
THIN Ni SILICIDE FORMATION BY LOW TEMPERATURE-INDUCED METAL ATOM REACTION WITH ION IMPLANTED AMORPHOUS SILICON
Materials Research Society |
North-Holland |
Materials Research Society |
4
Conference Proceedings
Fabrication of InP/SiO2/Si Substrate using Ion-Cuffing Process and Selective Chemical Etching
Electrochemical Society |
10
Conference Proceedings
Solid Phase Recrystallization and Strain Relaxation in Ion-Implanted Strained Si on SiGe Heterostructures
Materials Research Society |
North-Holland |
11
Conference Proceedings
UHV INTERFACE STUDIES OF PALLADIUM SILICIDE FORMATION ON HYDROGENATED AMORPHOUS SILICON FILMS
Materials Research Society |
North-Holland |
12
Conference Proceedings
Si-ON-SAPPHIRE AND Si IMPLANTED WITH Zr IONS: LATTICE LOCATION, SOLID PHASE EPITAXIAL REGROWTH AND ELECTRICAL PROPERTIES
North-Holland |