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TiN as a diffusion barrier for III-V metallization

Author(s):
Houghton, D. C.  
Publication title:
Thin films and interfaces II : symposium held November 1983, in Boston, Massachusetts, U.S.A.
Title of ser.:
Materials Research Society symposium proceedings
Ser. no.:
25
Pub. Year:
1984
Page(from):
149
Page(to):
156
Pages:
8
Pub. info.:
New York: North-Holland
ISSN:
02729172
ISBN:
9780444009050 [0444009051]
Language:
English
Call no.:
M23500/25
Type:
Conference Proceedings

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