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A comparison of thermal, line source electron beam and cw laser annealing for the fabrication of ErSi2 Schottky barrier on Si

Author(s):
Publication title:
Thin films and interfaces II : symposium held November 1983, in Boston, Massachusetts, U.S.A.
Title of ser.:
Materials Research Society symposium proceedings
Ser. no.:
25
Pub. Year:
1984
Page(from):
93
Page(to):
98
Pages:
6
Pub. info.:
New York: North-Holland
ISSN:
02729172
ISBN:
9780444009050 [0444009051]
Language:
English
Call no.:
M23500/25
Type:
Conference Proceedings

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