Blank Cover Image

SHORT TIME ANNEALING OF As and B ION IMPLANTED Si USING TUNGSTEN-HALOGEN LAMPS

Author(s):
Publication title:
Energy beam-solid interactions and transient thermal processing : symposium held November 1983 in Boston, Massachusetts, U.S.A.
Title of ser.:
Materials Research Society symposium proceedings
Ser. no.:
23
Pub. Year:
1984
Page(from):
293
Page(to):
298
Pages:
6
Pub. info.:
New York: North-Holland
ISSN:
02729172
ISBN:
9780444009036 [0444009035]
Language:
English
Call no.:
M23500/23
Type:
Conference Proceedings

Similar Items:

1 Conference Proceedings COMPARISON OF SHORT TIME ANNEALING OF IMPLANTED SILICON LAYERS WITH TUNGSTEN-HALOGEN LAMP AND MERCURY ARC LAMP SOURCES

Wouters, D., Avau, D., Mertens, P., Maes, H.E.

Materials Research Society
7 Conference Proceedings PULSED LASER ANNEALING OF BURIED DAMAGE IN ION IMPLANTED DIAMOND

Prawer, Steven, Jamieson, D. N., Dooley, S. P., Spizzirri, P., Ghiggino, K. P., Kalish, R.

Materials Research Society
2 Conference Proceedings CHARACTERIEATION OF ION IMPLANTED AND THIN EPITAXIAIL LAYER STRUCTURES USING PHOTOLUMINESCENCE

Hamilton, B., Sedgwick, T. O., Gelpey, J. C.

Materials Research Society
8 Conference Proceedings DLTS CHARACTERIZATION OF N-TYPE SILICON AFTER RAPID THERMAL ANNEALING OF BORON IMPLANTATION

Ransom, C.M., Sedgwick, T.O., Cohen, S.

Materials Research Society
3 Conference Proceedings SiO2 GROWTH AND ANNEALING BY LAMP HEATING

Weinberg, Z.A., Nguyen, T.N., Cohen, S.A., Kalish, R.

Materials Research Society
9 Conference Proceedings RAPID THERMAL ANNEALING OF Si-IMPLANTED GaAs

Rosenblatt, D. H., Hitchens, W. R., Shatas, S., Gat, A., Betts, D. A.

North-Holland
4 Conference Proceedings ANNEALING OF HIGH DOSE IMPLANTED GaAs WITH HALOGEN LAMPS

Nissim, Y. I., Joukoff, B., Sapriel, J., Henoc, P.

North-Holland
10 Conference Proceedings Mev Ion Implantation Doping of Diamond

Prawer, S., Jamieson, D.N., Nugent, K.W., Walker, R., Uzan-Saguy, C., Kalish, R.

Materials Research Society
5 Conference Proceedings Formation of carbon nanoclusters by implantation of keV carbon ions in fused silica followed by thermal annealing

Olivera, P., Peng, J. L., Liu, A., Reichart, P., MoCallum, J. C., Sze, J. Y., Lau, S. P., Tay, B. K., Kalish, R., Dhar, …

SPIE - The International Society of Optical Engineering
11 Conference Proceedings TITANIUM SILICIDATION BY HALOGEN LAMP ANNEALING

Okamoto, T., Shimizu, M., Tsukamoto, K., Matsukawa, T.

Materials Research Society
6 Conference Proceedings COMPARISON OF HEAT-PULSE AND FURNACE ISOTHERMAL ANNEALS OF Be IMPLANTED InP

Molnar, B., Kelner, G., Ramseyer, G. O., Morrison, G. H., Shatas, S. C.

North-Holland
12 Conference Proceedings Thermal stability of ion implanted, laser annealed films

Wilson, S.R., Paulson, W.M., Tam, G., Gregory, R.B., White, C.W., Appleton, B.R.

North Holland
1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12