Blank Cover Image

Atomic motion of dopant during interfacial silicide formation

Author(s):
Publication title:
Interfaces and contacts : symposium held November 1982 in Boston, Massachusetts, U.S.A.
Title of ser.:
Materials Research Society symposium proceedings
Ser. no.:
18
Pub. Year:
1983
Page(from):
191
Page(to):
196
Pages:
6
Pub. info.:
New York: North-Holland
ISSN:
02729172
ISBN:
9780444008206 [0444008209]
Language:
English
Call no.:
M23500/18
Type:
Conference Proceedings

Similar Items:

1 Conference Proceedings DOPANT EFFECTS ON THE KINETICS OF FORMATION OF PLATINUM SILICIDES

Wittmer, M., Psaras, P.A., Tu, K.N.

Materials Research Society
7 Conference Proceedings Diffusion in Cobalt Silicide During Silicide Formation

Comrie M. C., McLeod E. J.

Kluwer Academic Publishers
2 Conference Proceedings *DOPANT REDISTRIBUTION DURING SILICIDE FORMATION

Ohdomari, I., Konuma, K., Takano, M., Chikyow, T., Kawarada, H., Nakanishi, J., Ueno, T.

Materials Research Society
8 Conference Proceedings Formation and crystallizationof amorphous silicides at the interface between thin metal and amorphous silicon films

Herd, S. R., Ahn, K. Y., Tu, K. N.

North-Holland
3 Conference Proceedings Shallow contact formation of gadolinium silicide

Cheng, I. C., Lau, S. S., Thompson, R. D., Tu, K. N.

North-Holland
9 Conference Proceedings LOW-TEMPERATURE DIFFUSION OF DOPANTS IN SILICON

Fahey, P., Wittmer, M.

Materials Research Society
4 Conference Proceedings METAL RICH SILICIDE FORMATION BETWEEN THIN FILMS OF VANADIUM AND AMORPHOUS SILICON

Psaras, P. A., Eizenberg, M., Tu, K. N.

Materials Research Society
10 Conference Proceedings Light Scattering Measurement of Surface Topography During Formation of Titanium Silicide

Lavoie, C., Cabral, C., Jr., Clevenger, L. A., Harper, J. M. E., Jordan-Sweet, J., Saenger, K. L., Doany, F.

MRS - Materials Research Society
5 Conference Proceedings Formation and Transformation of Amorphous Silicide Alloys

Tu, K. N., Tien, T., Herd, S. R.

North-Holland
11 Conference Proceedings Post-irradiation annealing of laser-formed silicide layers

Wittmer, M., Allmen, M. von

North Holland
6 Conference Proceedings KINETICS AND THERMODYNAMICS OF AMORPHOUS SILICIDE FORMATION IN NICKEL/AMORPHOUS-SILICON MULTILAYER THIN FILMS

Clevenger, L. A, Thompson, C. V., de Avillez, R. R., Tu, K. N

Materials Research Society
12 Conference Proceedings BORON REDISTRIBUTION DURING FORMATION OF COBALT SILICIDES

Zaring, C., Svensson, B. G., Ostling M,

Materials Research Society
1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12