THE EFFECT OF OXYGEN IN COSPUTTERED (TITANIUM + SILICON ) FILMS
- Author(s):
- Beyers, R.
- Sinclair, R. ( Department of Materials Science and Engineering Stanford University, Stanford,. CA; )
- Thomas, M. E. ( Fairchild Camera and Instrument Corporation, Palo Alto, CA )
- Publication title:
- Defects in semiconductors II : symposium held November 1982 in Boston, Massachusetts, U.S.A.
- Title of ser.:
- Materials Research Society symposium proceedings
- Ser. no.:
- 14
- Pub. Year:
- 1983
- Page(from):
- 423
- Page(to):
- 428
- Pages:
- 6
- Pub. info.:
- New York: North-Holland
- ISSN:
- 02729172
- ISBN:
- 9780444008121 [0444008128]
- Language:
- English
- Call no.:
- M23500/14
- Type:
- Conference Proceedings
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