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High performance SOI technology for sub-45nm gate length CMOS manufacturing Invited

Author(s):
Horstmann, M.
Greenlaw, D.
Huebler, P.
Stephan, R.
Feudel, Th.
Wei, A.
Frohberg, K.
Hoentschel, J.
Javorka, P.
Burbach, G.
Schwan, C.
Peters, C.
Lenski, M
Press, P.
Kammler, Th.
Bierstedt, H.
Otterbach, R.
Neu, A.
Wieczorek, K.
Schaller, M.
Salz, H.
Hohage, J.
Ruelke, H.
Klais, J.
Grasshoff, G.
Ehrichs, E.
Goad, S.
Raab, M.
Kepler, N.
24 more
Publication title:
Silicon-on-insulator technology and devices XII : proceedings of the international symposium
Title of ser.:
Electrochemical Society Proceedings Series
Ser. no.:
2005-03
Pub. date:
2005
Page(from):
57
Page(to):
68
Pages:
12
Pub. info.:
Pennington, N.J.: Electrochemical Society
ISSN:
01616374
ISBN:
9781566774611 [1566774616]
Language:
English
Call no.:
E23400/200503
Type:
Conference Proceedings

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