Blank Cover Image

Fluorocarbon Post-Plasma Etch Residue Cleaning With Naphthalenide Radical Anions

Author(s):
Publication title:
Electrochemical processes in ULSI and MEMS : proceedings of the international symposium
Title of ser.:
Electrochemical Society Proceedings Series
Ser. no.:
2004-17
Pub. Year:
2005
Page(from):
275
Page(to):
282
Pages:
8
Pub. info.:
Pennington, N.J.: Electrochemical Society
ISSN:
01616374
ISBN:
9781566774727 [1566774721]
Language:
English
Call no.:
E23400/200417
Type:
Conference Proceedings

Similar Items:

Deshmukh, S., Burke, R., Chang, J., Cheng, C.C.

Electrochemical Society

Anishchenko, E., Diamant, V., Kagadei, V.A., Nefeyodtsev, E., Proskurovsky, D.I., Romanenko, S.

SPIE - The International Society of Optical Engineering

Chang, C.K., Tsang, C.F., Nguyen, V., Zhang, Q., Foo, T.H.

Electrochemical Society

Hikosaka, Y., Sugai, H.

Electrochemical Society

Myneni, S., Hess, D.

Electrochemical Society

Vaswani, S., Koskinen, J., Zauscher, S., Hess, D.

Electrochemical Society

D. Hellin, I.J. Vos, G. Vereecke, E. Pavel, W. Boullart

Electrochemical Society

Pearton, S.J., Ren, F., Katz, A., Chakrabarti, U.K., Lane, E., Hobson, W.S., Kopf, R.F., Abernathy, C.R., Wu, C.S., …

Materials Research Society

Zhang, H., Chen, B.H., Ye, J.H., Chooi, S.Y.M., Cha, R., Cha, L.

Electrochemical Society

Tserepi D. A., Derouard J., Sadeghi N., Booth P. J.

Kluwer Academic Publishers

1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12