Blank Cover Image

(18.5) 11:35 - 11:55 AM - Ultra-Shallow Junction Formation in Strained Si/Sil-xGex using Flash-Assist RTA

Author(s):
Kohli, P.
Wise, R.
Braithwaite, G.
Currie, M. T.
Lochtefeld, A.
Rodder, M.
Bennett, J.
Gostowski, M.
Nguyen, B.
Cleavelin, R.
Yu, S.
Pas, M.
Gelpey, J.
McCoy, S.
Campion, A.
Chaumont, M. (SEMATECH)
11 more
Publication title:
SiGe: materials, processing, and devices : proceedings of the First international symposium
Title of ser.:
Electrochemical Society Proceedings Series
Ser. no.:
2004-07
Pub. Year:
2004
Page(from):
1113
Page(to):
1114
Pages:
2
Pub. info.:
Pennington, N.J.: Electrochemical Society
ISSN:
01616374
ISBN:
9781566774208 [1566774209]
Language:
English
Call no.:
E23400/200407
Type:
Conference Proceedings

Similar Items:

1 Conference Proceedings (4.12) 7:58 - 8:01 PM - SIMS Depth Profiling of Band As Implants in Si1_xGex and Strained Si/Si1_xGex

Bennett, J., Kohli, P., Wise, R., Rodder, M., Yu, S., Cleavelin, R., Pas, M., Braithwaite, G., Currie, M.T., Lochtefeld, …

Electrochemical Society
7 Conference Proceedings Luminescence in Si/Strained Si1-xGex Heterostructures

Sturm, J. C., Amour, A. St., Lacroix, Y., Thewalt, M. L. W.

MRS - Materials Research Society
2 Conference Proceedings (18.3) 10:55 - 11:15 AM - Growth and Morphological Stability of Nickel Germano-Silicide on Strained Si1_xGex (x=0.1 to 0.25) Under Rapid Thermal Annealing

Carron, V., Hartmann, J. M., Holliger, P., Laugier, F., Holland, G. (CEA-DRT - LETLOTS - CEA/GRE)

Electrochemical Society
8 Conference Proceedings Strained- Si/SiGe/Si heterostructures : Nanos cale structural, chemical and electrical characterization (invited paper)

Rozgonyi, G., Lu, J., Zhao, W., Zhang, R., Chaumont, M.

Electrochemical Society
3 Conference Proceedings Device Characteristics of Ultra-Shallow Junctions Formed by fRTP Annealing

Satta, A., Lindsay, R., Severi, S., Henson, K., Maex, K., McCoy, S., Gelpey, J., Elliott, K.

Materials Research Society
9 Conference Proceedings Strained Silicon Two-dimensional Electron Gases On Commercially Available Si1-xGex Relaxed Graded Buffers

K. Yao, J. Sturm, A. Lochtefeld

Electrochemical Society
4 Conference Proceedings Crystal Damage Removal by Spike and Flash Annealing

W. Lerch, S. Paul, J. Niess, S. McCoy, J. Gelpey, F. Cnistiano, R. Duffr, S. Boninelli, O. Marcelot, P. Francesco

Electrochemical Society
10 Conference Proceedings Temperature Profiles During Millisecond Processing

D.M. Camm, J.C. Gelpey, S. McCoy, G. Stuart, H. Kheyrandish

Electrochemical Society
5 Conference Proceedings Effects of Hydrogen Annealing Process Conditions on Nano Scale Silicon (011) Fins

Zaman, Rownak J., Xiong, Weize, Quintanilla, Rudy, Schulz, Thomas, Cleavelin, C. Rinn, Wise, Rick, Pas, Mike, Patruno, …

Materials Research Society
11 Conference Proceedings Dopant Diffusion in Strained and Relaxed Si1-xGex

Paine,A.D.N., Morooka,M., Willoughby,A.F.W., Bonar,J.M., Phillips,P., Dowsett,M.G., Cooke,G.

Trans Tech Publications
6 Conference Proceedings Efficacy of Damage Annealing in Advanced Ultra-Shallow Junction Processing

Paul Timans, Yao Zhi Hu, Jeff Gelpey, Steve McCoy, Wilfried Lerch, Silke Paul, Detlef Bolze, Hamid Kheyrandish

Materials Research Society
12 Conference Proceedings Relaxation of Strained Si₁₋xGex by Dry Oxidation

B. Min, D. Ko, M. Cho, T. Lee, K. Choi

Electrochemical Society
1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12