(14.1) 10:05 - 10:25AM - Retardation of Arsenic Diffusion in Silicon-Germanium by co-Implantation
- Author(s):
Dokumaci, O. Ronsheim, P. Mocuta, A. Mocuta, D. Kozlowski, P. Chidambarrao, D. Saunders, P. Chen, H. (IBM) - Publication title:
- SiGe: materials, processing, and devices : proceedings of the First international symposium
- Title of ser.:
- Electrochemical Society Proceedings Series
- Ser. no.:
- 2004-07
- Pub. Year:
- 2004
- Page(from):
- 893
- Page(to):
- 902
- Pages:
- 10
- Pub. info.:
- Pennington, N.J.: Electrochemical Society
- ISSN:
- 01616374
- ISBN:
- 9781566774208 [1566774209]
- Language:
- English
- Call no.:
- E23400/200407
- Type:
- Conference Proceedings
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