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Towards 0.5 nm EOT Scaling of HfO2/Metal Electrode Gate Stacks

Author(s):
Peterson, J. J.
Brown, G. A.
Matthews, K.
Gutt, J.
Gopalan, S.
Li, H. -J.
Kirsch, P.
Barnett, J.
Moumen, N.
Huffman, C.
Majhi, P.
Chaudhary, N.
Young, C. D.
Sassman, B.
Lee, B. -H.
Ruelke, H.
Schuehrer, H.
Stephan, R.
Wei, A.
Werner, T.
Wieczorek, K.
Raab, M.
17 more
Publication title:
Dielectrics for nanosystems: materials science, processing, reliability, and manufacturing : proceedings of the First international symposium
Title of ser.:
Electrochemical Society Proceedings Series
Ser. no.:
2004-04
Pub. date:
2004
Page(from):
443
Page(to):
451
Pages:
9
Pub. info.:
Pennington, N.J.: Electrochemical Society
ISSN:
01616374
ISBN:
9781566774178 [1566774179]
Language:
English
Call no.:
E23400/200404
Type:
Conference Proceedings

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