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Aid HfSiO High-k Dielectric and CVD-TaN Metal Gate

Author(s):
Chung, U. I.
Park, S. G.
Cho, H. -J.
Lee, H. L.
Park, H. B.
Jeon, T. S.
Jin, B. J.
Kang, S. B.
Shin, Y. G.
Moon, J. T.
5 more
Publication title:
Dielectrics for nanosystems: materials science, processing, reliability, and manufacturing : proceedings of the First international symposium
Title of ser.:
Electrochemical Society Proceedings Series
Ser. no.:
2004-04
Pub. Year:
2004
Page(from):
362
Page(to):
368
Pages:
7
Pub. info.:
Pennington, N.J.: Electrochemical Society
ISSN:
01616374
ISBN:
9781566774178 [1566774179]
Language:
English
Call no.:
E23400/200404
Type:
Conference Proceedings

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