High-k hafnium silicate films on silicon and germanium wafers by MOCVD using single-source precursor

High-k hafnium silicate films on silicon and germanium wafers by MOCVD using single-source precursor

Author(s):

Lemberger, M.

Publication title:

EUROCVD-15, fifteenth European Conference on Chemical Vapor Deposition : proceedings of the international symposium

Title of ser.:

Electrochemical Society Proceedings Series

Ser. no.:

2005-09

Pub. Year:

2005

Page(from):

873

Page(to):

880

Pages:

8

Pub. info.:

Pennington, NJ: Electrochemical Society

ISSN:

01616374

ISBN:

9781566774277 [1566774276]

Language:

English

Call no.:

E23400/200509

Type:

Conference Proceedings

Details

TDL ID:	ZA00015392
Series ID:	PA00000028
Conf. info. (Name):	European Conference on Chemical Vapor Deposition - EUROCVD
Conf. info. (Number):	15th
Conf. info. (Venue):	Bochum, Germany
Conf. info. (Date):	2005.09.05-2005.09.09

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