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Numerical simulation of SiC processes: A characterization tool for the design of epitaxial structures in electronics

Author(s):
Pans, M.
Nishizawa, S.
Wettmann, P.
Ucar, M.
Blanquet, E.
Dedulle, J. M.
Baillet, F.
Chaussende, D.
Bernard, C.
Madar, R.
5 more
Publication title:
EUROCVD-15, fifteenth European Conference on Chemical Vapor Deposition : proceedings of the international symposium
Title of ser.:
Electrochemical Society Proceedings Series
Ser. no.:
2005-09
Pub. Year:
2005
Page(from):
1
Page(to):
12
Pages:
12
Pub. info.:
Pennington, NJ: Electrochemical Society
ISSN:
01616374
ISBN:
9781566774277 [1566774276]
Language:
English
Call no.:
E23400/200509
Type:
Conference Proceedings

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