Characterization and Performance Evaluation of an APS Pixel in a Standard 2 um CMOS Technology

Characterization and Performance Evaluation of an APS Pixel in a Standard 2 um CMOS Technology

Author(s):

Mestanza, S. N. M.

Publication title:

Microelectronics technology and devices : SBMICRO 2005 : proceedings of the twentieth international symposium

Title of ser.:

Electrochemical Society Proceedings Series

Ser. no.:

2005-08

Pub. Year:

2005

Page(from):

32

Page(to):

38

Pages:

7

Pub. info.:

Pennington, N.J.: Electrochemical Society

ISSN:

01616374

ISBN:

9781566774260 [1566774268]

Language:

English

Call no.:

E23400/200508

Type:

Conference Proceedings

Details

TDL ID:	ZA00015391
Series ID:	PA00000028
Conf. info. (Name):	SBMICRO
Conf. info. (Number):	20th (2005)
Conf. info. (Venue):	Sao Paulo, Brazil
Conf. info. (Date):	2005.09.04-2005.09.07

Similar Items:

1 Conference Proceedings Development of CMOS-APS Technology Jimenez, H.G., Mufioz, S.N.M., Pavanello, M.A., Silva, I.F., Diniz, J.A., Zakia, M.B., Doi, I., Swart, J.W. Electrochemical Society	7 Conference Proceedings Growth and Characterization of Silicon Nanocrystals Obtained by Ion Implantation Dias, G. O., Mestanza, S. N. M., Queiroz, J. E. C., Marins, E. S. V. P., Doi, I., Rodriguez, E., Tejero, D. C. B. Electrochemical Society
2 Conference Proceedings High Sensitivity Obtained by Three-Color Detector APS-CMOS Using Antireflective Coating Mestanza, S. N. M., Biasotto, C., Costa, A. C., Dias, G. O., Doi, I., Diniz, J. A., Swart, J. W. Electrochemical Society	8 Conference Proceedings The Effect of Nitrogen Concentration at Silicon Oxynitride Gate Insulators Formed by 28N2+ Implantation into Silicon with Additional Conventional or Rapid … Felicio, A.G., Diniz, J.A., Godoy Fo., J., Doi, I., Pudeozi, M.A.A., Swart, J.W. Electrochemical Society
3 Conference Proceedings Preparation and Characterization of Silicon Nanostructures Obtained by Ion Implantation Mestanza, S. N. M., Dias, G. O., Queiroz, J. E. C., Doi, I., Swart, J. W., Rodriguez, E., Neves, A. A. R., Martinho, H. Electrochemical Society	9 Conference Proceedings Ultra-Thin Silicon Oxynitride Gate-Dielectric Made by ECR Plasmas Manera, G.A., Diniz, J.A., Doi, I., Swart, J.W. Electrochemical Society
4 Conference Proceedings Three-Color Detector for APS-CMOS Image Sensors Employing a Yriple Junction Mestanza, S.N.M, Manera, L.T., de Sousa, A.C.T, Silva, I.F., Doi, I., Swart, J.W. Electrochemical Society	10 Conference Proceedings Characteristics of Polycrystalline Si1-xGex Alloy Deposited in a Vertical LPCVD System Teixeira, R. C., Doi, I., Diniz, J. A., Swart, J. W., Zakia, M. B. P., dos Santos Filho, S. G. Electrochemical Society
5 Conference Proceedings Photoresponse Analysis of Sensors Fabricated with Standard 2.0 μm CMOS Technology D. R. Huanca, E. Rocbiquez, I. Doi, J. A. Diniz, J. W. Swart, N. C. Frateschi Electrochemical Society	11 Conference Proceedings Silicon Oxynitride Gate-Dielectric Made by ECR Plasma Oxynitridation Manera, G. A., Diniz, J. A., Moshkalyov, S. A., Lujan, G. S., Doi, I., Swart, J. W. Electrochemical Society
6 Conference Proceedings Control of Micron and Submicron Feature Dimensions in 2um Resolution Photolithographic System for MOS and MEMS Applications Fioravante, N. P. Jr., Manera, L. T., Moshkalyov, S. A., Diniz, J. A., Tatsch, P. J., Grados, H. R. J., Doi, I., Swart, … Electrochemical Society	12 Conference Proceedings A CMOS Technology for Educational Activities and Academic Projects Jimenez G., H. R., Manera, L. T., Camolesi, A., Fruett, F., Diniz, J. A., Tatsch, P. J. Electrochemical Society

1

2

3

4

5

6

7

8

9

10

11

12