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High Density Remote Plasma Enhanced Atomic Layer Deposition of Ruthenium Thin Films

Author(s):
Publication title:
ULSI Process Integration : proceedings of the International Symposium
Title of ser.:
Electrochemical Society Proceedings Series
Ser. no.:
2005-06
Pub. Year:
2005
Page(from):
218
Page(to):
220
Pages:
3
Pub. info.:
Pennington, N.J.: Electrochemical Society
ISSN:
01616374
ISBN:
9781566774642 [1566774640]
Language:
English
Call no.:
E23400/200506
Type:
Conference Proceedings

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