63 Thermal Stability of a Novel Graded Layer for Relaxed SiGe/Si Heteroepitaxy
- Author(s):
Wong, L.H. Wong, C.C. Ferraris, C. White, T.J. Liu, J.P. Chan, L. Sohn, O.K. Hsia, L. C. - Publication title:
- Advanced gate stack, source/drain and channel engineering for Si-based CMOS, new materials, processes, and equipment : proceedings of the international symposium
- Title of ser.:
- Electrochemical Society Proceedings Series
- Ser. no.:
- 2005-05
- Pub. Year:
- 2005
- Page(from):
- 529
- Page(to):
- 534
- Pages:
- 6
- Pub. info.:
- Pennington, NJ: Electrochemical Society
- ISSN:
- 01616374
- ISBN:
- 9781566774635 [1566774632]
- Language:
- English
- Call no.:
- E23400/200505
- Type:
- Conference Proceedings
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