43 Investigation of Nitrided Hafnium Silicates for High-K Dielectrics Using Photoelectron Spectroscopy
- Author(s):
Mathew, A. Demirkan, K. Opila, R.L. Wang, C.-G. Maes, J. W. Wilk, G. - Publication title:
- Advanced gate stack, source/drain and channel engineering for Si-based CMOS, new materials, processes, and equipment : proceedings of the international symposium
- Title of ser.:
- Electrochemical Society Proceedings Series
- Ser. no.:
- 2005-05
- Pub. Year:
- 2005
- Page(from):
- 360
- Page(to):
- 365
- Pages:
- 6
- Pub. info.:
- Pennington, NJ: Electrochemical Society
- ISSN:
- 01616374
- ISBN:
- 9781566774635 [1566774632]
- Language:
- English
- Call no.:
- E23400/200505
- Type:
- Conference Proceedings
Similar Items:
SPIE - The International Society of Optical Engineering |
7
Conference Proceedings
Surface composition of a norbornene-maleic-anhydride-based 193-nm photoresists for different photoacid generators as determined by x-ray photoelectron …
SPIE - The International Society for Optical Engineering |
2
Conference Proceedings
Examine photoelectron spectra of Hf and Zr silicate to probe composition and phase segregation.
Electrochemical Society |
Electrochemical Society |
Electrochemical Society |
9
Conference Proceedings
Study of Metal/Barrier/Low-K Interfaces for Interlayer Dielectric Applications
Electrochemical Society |
Society of Vacuum Coaters |
Electrochemical Society |
Electrochemical Society |
11
Conference Proceedings
CHARACTERIZATION OF SPUTTER DEPISITED Al-NITRIDE AND Al-OXIDE BYX-RAY PHOTOELECTRON LOSS SPECTROSCOPY
Materials Research Society |
Electrochemical Society |
12
Conference Proceedings
XPS Investigation of Oxidation of Cu Seed Layers for Microelectronics Applications
Electrochemical Society |