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33 ALD of Advanced High-k and Metal Gate Stacks for MOS Devices

Author(s):
Gutt, J.
Gopalan, S.
Brown, G. A.
Kirsch, P. D.
Peterson, J. J.
Gardner, M.
Li, H.-J.
Lysaght, P.
Alshareef, H. N.
Choi, K.
Huffman, C.
Wen, H. C.
Majhi, P.
Lee, B. H.
Chatham, H.
Park, S.
Lanee, S.
Bartholomew, L.
Senzaki, Y. (Invited Paper)
14 more
Publication title:
Advanced gate stack, source/drain and channel engineering for Si-based CMOS, new materials, processes, and equipment : proceedings of the international symposium
Title of ser.:
Electrochemical Society Proceedings Series
Ser. no.:
2005-05
Pub. date:
2005
Page(from):
282
Page(to):
292
Pages:
11
Pub. info.:
Pennington, NJ: Electrochemical Society
ISSN:
01616374
ISBN:
9781566774635 [1566774632]
Language:
English
Call no.:
E23400/200505
Type:
Conference Proceedings

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