22 Pulsed Excimer Laser Annealing for Meeting Near-Term Gate-Stack Process Challenges

22 Pulsed Excimer Laser Annealing for Meeting Near-Term Gate-Stack Process Challenges

Author(s):

Wong, H.Y.

Publication title:

Advanced gate stack, source/drain and channel engineering for Si-based CMOS, new materials, processes, and equipment : proceedings of the international symposium

Title of ser.:

Electrochemical Society Proceedings Series

Ser. no.:

2005-05

Pub. Year:

2005

Page(from):

179

Page(to):

187

Pages:

9

Pub. info.:

Pennington, NJ: Electrochemical Society

ISSN:

01616374

ISBN:

9781566774635 [1566774632]

Language:

English

Call no.:

E23400/200505

Type:

Conference Proceedings

Details

TDL ID:	ZA00015388
Series ID:	PA00000028
Conf. info. (Name):	International Symposium on Advanced Gate Stack, Source/Drain and Channel Engineering for Si-based CMOS ; Meeting of the Electrochemical Society
Conf. info. (Number):	2005 ; 207th
Conf. info. (Venue):	Quebec City, QC, Canada
Conf. info. (Date):	2005.05.16-2005.05.18

Similar Items:

1 Conference Proceedings Reduced Poly-Si Gate Depletion Effect by Pulsed Excimer Laser Annealing Wong, H.Y., Takeuchi, H., King, T.-J., Ameen, M., Agarwal, A. Electrochemical Society	7 Conference Proceedings THE ANNEALING OF PHOSPHORUS-ION-IMPLANTED COPPER INDIUM DISULFIDE BY A PULSED ELECTRON BEAM Lin, J.L., Ueng, H.Y., Yang, M.H., Lue, J.T., Hwang, H.L. Materials Research Society
2 Conference Proceedings Process and Manufacturing Challenges for High-K Gate Stack Systems Gilmer, M. C., Luo, T-Y., Huff, H. R., Jackson, M. D., Kim, S., Bersuker, G., Zeitzoff, P., Vishnubhotla, L., Brown, G. … MRS - Materials Research Society	8 Conference Proceedings Compact short-pulse laser for near-field range-gated imaging Zutavern,F.J., Helgeson,W.D., Loubriel,G.M., Yates,G.J., Gallegos,R.A., McDonald,T.E.,Jr SPIE-The International Society for Optical Engineering
3 Conference Proceedings Process Optimization in Atomic Layer Deposition of High-K Oxides for Advanced Gate Stack Engineering Londergan, A.R., Ramanathan, S., Vu, K., Rassiga, S., Hiznay, R., Winkler, J., Velasco, H., Matthysse, L., Seidel, T.E., … Electrochemical Society	9 Conference Proceedings 11 Ultra-shallow junction formation: current manufacturability issues and future prospects Hebb, J., Agarwal, A., Gossmann, H., Ameen, M., Stevenson, A., Jones, M. Electrochemical Society
4 Conference Proceedings Pulsed Excimer Laser Processing of AlN/GaN Thin Films Wong, W. S., Schloss, L. F., G. S. Sudhir, Linder, B. P., Yu, K-M., Weber, E. R., Sands, T., Cheung, N. W. MRS - Materials Research Society	10 Conference Proceedings EFFECT OF PULSE DURATION ON THE ANNEALING OF ION IMPLANTED SILICON WITH A XeC1 EXCIMER LASER AND SOLAR CELLS Young, R. T., Narayan, J., Christie, W. H., van der Leeden, G. A., Rothe, D. E., Sandstro, R. L. North-Holland
5 Conference Proceedings Integration Issues with High k Gate Stacks* Osburn, C.M., Han, S.K., Kim, I., Campbell, S.A., Garfunkel, E., Gustafson, T., Hauser, J., King, T.-J., Liu, Q., … Electrochemical Society	11 Conference Proceedings CRYSTALLIZATION KINETICS OF HYDROGENATED AMORPHOUS SILICON DURING PULSED EXCIMER LASER ANNEALING Ready, SE., Roh, J.H., Boyce, J.B., Anderson, G.B. Materials Research Society
6 Conference Proceedings Excimer laser drilling of polymers Chen,Y.H., Zheng,H.Y., Wong,K.S., Tam,S.C. SPIE-The International Society for Optical Engineering	12 Conference Proceedings Heteroepitaxial Growth of TaN on MgO(001) and TiN(001)/Si(001) by Pulsed Laser Deposition Cheung, H.Y., Wong, K.H. Materials Research Society

1

2

3

4

5

6

7

8

9

10

11

12