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13 High-k Gate Stack Engineering - towards Meeting Low Standby Power and High Performance Targets

Author(s):
De Gendt, S.
Brunco, D.
Caymax, M.
Canard, T.
Date, L.
Delabie, A.
Deweerd, W.
Groeseneken, G.
Houssa, M.
Hyun, S.
Kaushik, V.
Kubicek, S.
Maes, J.
Pantisano, L.
Ragnarsson, L.
Rohr, E.
Schram, T.
Shimamoto, Y.
Sleeckx, E.
Vandervorst, W.
Van Elshocht, S.
Yamamoto, K.
Witters, T.
Zhao, C.
Zimmerman, P.
Heyns, M. (Invited Paper)
21 more
Publication title:
Advanced gate stack, source/drain and channel engineering for Si-based CMOS, new materials, processes, and equipment : proceedings of the international symposium
Title of ser.:
Electrochemical Society Proceedings Series
Ser. no.:
2005-05
Pub. date:
2005
Page(from):
109
Page(to):
117
Pages:
9
Pub. info.:
Pennington, NJ: Electrochemical Society
ISSN:
01616374
ISBN:
9781566774635 [1566774632]
Language:
English
Call no.:
E23400/200505
Type:
Conference Proceedings

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