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Far- and Mid-Infrared Absorption Study of HfO2/SiO2/Si System

Author(s):
Publication title:
Silicon nitride, silicon dioxide thin insulating films, and other emerging dieletrics VIII : proceedings of the international symposium
Title of ser.:
Electrochemical Society Proceedings Series
Ser. no.:
2005-01
Pub. date:
2005
Page(from):
471
Page(to):
481
Pages:
11
Pub. info.:
Pennington, N.J.: Electrochemical Society
ISSN:
01616374
ISBN:
9781566774598 [1566774594]
Language:
English
Call no.:
E23400/200501
Type:
Conference Proceedings

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