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Recent Development of CMOS Technology with Hf-Based High-k Dielectric

Author(s):
Song, S.C.
Bersuker, G.
Zhang, Z.
Lee, B.H.
Huffman, C.
Bae, S.H.
Sim, J.H.
Kirsch, P.
Majhi, P.
Moumen, N,
Ramiller, C.
6 more
Publication title:
Silicon nitride, silicon dioxide thin insulating films, and other emerging dieletrics VIII : proceedings of the international symposium
Title of ser.:
Electrochemical Society Proceedings Series
Ser. no.:
2005-01
Pub. Year:
2005
Page(from):
456
Page(to):
470
Pages:
15
Pub. info.:
Pennington, N.J.: Electrochemical Society
ISSN:
01616374
ISBN:
9781566774598 [1566774594]
Language:
English
Call no.:
E23400/200501
Type:
Conference Proceedings

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