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Point Defects and Traps in Stacks of Ultrathin High-k Metal Oxides on Si Probed by Electron Spin Resonance: Si/HfO2 System and N Incorporation

Author(s):
Publication title:
Silicon nitride, silicon dioxide thin insulating films, and other emerging dieletrics VIII : proceedings of the international symposium
Title of ser.:
Electrochemical Society Proceedings Series
Ser. no.:
2005-01
Pub. Year:
2005
Page(from):
403
Page(to):
416
Pages:
14
Pub. info.:
Pennington, N.J.: Electrochemical Society
ISSN:
01616374
ISBN:
9781566774598 [1566774594]
Language:
English
Call no.:
E23400/200501
Type:
Conference Proceedings

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