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Properties of High-k and Extremely Thin Silicon Nitride Stacks

Author(s):
Zhang, Z.
Fedorenko, Y.
Truong, L.
Shi, X.
Afanas'ev, V.
Stesmans, A.
Campbell, S.A.
2 more
Publication title:
Silicon nitride, silicon dioxide thin insulating films, and other emerging dieletrics VIII : proceedings of the international symposium
Title of ser.:
Electrochemical Society Proceedings Series
Ser. no.:
2005-01
Pub. Year:
2005
Page(from):
375
Page(to):
388
Pages:
14
Pub. info.:
Pennington, N.J.: Electrochemical Society
ISSN:
01616374
ISBN:
9781566774598 [1566774594]
Language:
English
Call no.:
E23400/200501
Type:
Conference Proceedings

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