High Density Plasma Growth of Thermal Quality SiO2 Thin Films

High Density Plasma Growth of Thermal Quality SiO2 Thin Films

Author(s):

Publication title:

Silicon nitride, silicon dioxide thin insulating films, and other emerging dieletrics VIII : proceedings of the international symposium

Title of ser.:

Electrochemical Society Proceedings Series

Ser. no.:

2005-01

Pub. Year:

2005

Page(from):

124

Page(to):

135

Pages:

12

Pub. info.:

Pennington, N.J.: Electrochemical Society

ISSN:

01616374

ISBN:

9781566774598 [1566774594]

Language:

English

Call no.:

E23400/200501

Type:

Conference Proceedings

Details

TDL ID:	ZA00015386
Series ID:	PA00000028
Conf. info. (Name):	Symposium on Silicon Nitride and Silicon Dioxide Thin Insulating Films ; Meeting of the Electrochemical Society
Conf. info. (Number):	8th ; 207th
Conf. info. (Venue):	Quebec City, Quebec, Canada
Conf. info. (Date):	2005.05.16-2005.05.20

Similar Items:

1 Conference Proceedings High Density Plasma Processing of Microcrystalline Si Thin Films Joshi, P.C., Voutsas, A.T., Hartzell, J.W. Materials Research Society	7 Conference Proceedings High Performance TFT Circuits for all-Integrated Systems on Stainless Steel Foils Troccoli, M., Afentakis, T., Chuang, T.H., Chang, Y.L., Hatalis, M., Voutsas, A.P., Hartzell, J.W., Chouvardas, V. Electrochemical Society
2 Conference Proceedings Low-temperature processing of SiO2 thin films by HD-PECVD technique for gate dielectric applications Joshi, P.C., Moriguchi, M., Crowder, M.A., Droes, S.R.T., Flores, J.S., Voutsas, A.T., Hartzell, J.W. SPIE-The International Society for Optical Engineering	8 Conference Proceedings Properties of Amorphous and Crystalline Ta2O5 Thin Films Prepared by Metalorganic Solution Deposition Technique for Integrated Electronic Devices Joshi, P.C., Cole, M.W. Materials Research Society
3 Conference Proceedings Low Temperature Processing of SiO2 Thin Films by PECVD Technique Using an Inductively-Coupled High-Density RF Plasma Source Joshi, P., Droes, S., Flores, J., Voutsas, T., Hartzel, J. Electrochemical Society	9 Conference Proceedings Low Temperature Growth of High Quality SiO2 at Less Than 100℃ By ECR-PECVD For Thin Film Transistors Rashid, Riyaz, Flewitt, A.J., Robertson, John, Milne, W.I. Electrochemical Society
4 Conference Proceedings High-performance poly-silicon circuits on thin metal foils Afentakis, T., Hatalis, M.K., Voutsas, A.T., Hartzell, J.W. SPIE-The International Society for Optical Engineering	10 Conference Proceedings Al Doped Ta2O5 Thin Films for Microelectronic Applications Joshi, P.C., Cole, M.W., Hubbard, C.W., Ngo, E. Materials Research Society
5 Conference Proceedings Poly-silicon TFT AM-OLED on thin flexible metal substrates Afentakis, T., Hatalis, M.K., Voutsas, A.T., Hartzell, J.W. SPIE-The International Society for Optical Engineering	11 Conference Proceedings IN SITU GROWTH OF HIGH QUALITY EPITAXIAL YBA2Cu3O7-X THIN FILMS AT MODERATE TEMPERATURES BY PULSED LASER ABLATION Lowndes, Douglas H., Norton, David P., McCamy, J.W., Feenstra, R., Budai, J.D., Christen, D.K., Poker, D.B. Materials Research Society
6 Conference Proceedings High Performance Polysilicon Thin Film Transistor Circuits on Flexible Stainless Steel Foils Afentakis, Themis, Hatalis, Miltiadis K., Voutsas, Apostolos T., Hartzell, John W. Materials Research Society	12 Conference Proceedings Fire Retardancy and Thermal Stability of Materials Coated by Organosilicon Thin Films Using a Cold Remote Plasma Process Jama,C., Quede,A., Goudmand,P., Dessaux,O., Bras,M.Le, Delobel,R., Bourbigot,S., Gilman,J.W., Kashiwagi,T. American Chemical Society

1

2

3

4

5

6

7

8

9

10

11

12