The Use of Advanced Lithography to Pattern Self-Assembled Monolayers (SAMs)

The Use of Advanced Lithography to Pattern Self-Assembled Monolayers (SAMs)

Author(s):

Kim, Tae K. ( University of Wisconsin, Madison, WI )
Yang, Xiao M ( University of Wisconsin, Madison, WI )
Nealey, Paul F. ( University of Wisconsin, Madison, WI )
Peters, Richard D. ( University of Wisconsin, Madison, WI )

Publication title:

AIChE 1999 ANNUAL MEETING

Title of ser.:

AIChE meeting [papers]

Ser. no.:

1999

Pub. Year:

1999

Paper no.:

92d

Pages:

2

Pub. info.:

New York: American Institute of Chemical Engineers

Language:

English

Call no.:

A08000

Type:

Conference Proceedings

Details

TDL ID:	ZA00015170
Series ID:	PA00000179
Conf. info. (Name):	AIChE Annual Meeting
Conf. info. (Number):	1999
Conf. info. (Venue):	Dallas, TX, USA
Conf. info. (Date):	1999.10.31-1999.11.05
Note for article:	Fiche 7

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