Deposition of Poly-Si by Remote Plasma CVD with Si2H6-SiF4
- Author(s):
- Rhee, S.-W. ( Department of Chemical Engineering, Laboratory for Advanced Materials Processing, Pohang University of Science and Technology, Pohang, Korea )
- Lee, I.-J. ( Department of Chemical Engineering, Laboratory for Advanced Materials Processing, Pohang University of Science and Technology, Pohang, Korea )
- Kim, D.-H. ( Department of Chemical Engineering, Laboratory for Advanced Materials Processing, Pohang University of Science and Technology, Pohang, Korea )
- Publication title:
- AIchE 1994 Annual Meeting : November 13-18 San Francisco Hilton and Towers Hotel, San Francisco, California
- Title of ser.:
- AIChE meeting [papers]
- Ser. no.:
- 1994
- Pub. Year:
- 1994
- Paper no.:
- 18c
- Pages:
- 7
- Pub. info.:
- New York: American Institute of Chemical Engineers
- Language:
- English
- Call no.:
- A08000/950031
- Type:
- Conference Proceedings
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