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Particle Growth Mechanism of Aluminum Nitride Prepared by Chemical Vapor Deposition Method

Author(s):
  • Kim, H. J. ( University of Tokyo, Bunkyo-ku, Tokyo 113, JAPAN )
  • Egashira, Y. ( University of Tokyo, Bunkyo-ku, Tokyo 113, JAPAN )
  • Komiyama, H. ( University of Tokyo, Bunkyo-ku, Tokyo 113, JAPAN )
  • Sadakata, M. ( University of Tokyo, Bunkyo-ku, Tokyo 113, JAPAN )
Publication title:
AIChE 1994 SUMMER MEETING - DENVER, CO - AUGUST 14-17, 1994
Title of ser.:
AIChE meeting [papers]
Ser. no.:
1994
Pub. Year:
1994
Paper no.:
67g
Pages:
19
Pub. info.:
New York: American Institute of Chemical Engineers
Language:
English
Call no.:
A08000
Type:
Conference Proceedings

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