Heck, R. M., Chen, J. M., Speronello, B. K.
American Institute of Chemical Engineers
|
Ito, E., Hultermans, R. J., Lugt, P. M., Burgers, M. H. W., Bekkum, H. van, Bleek, C. M. van den
Elsevier
|
Heck, R. M., Chen, J. M., Speronello, B. K., Morris, L.
American Chemical Society
|
Coq, B., Kieger, S., Delahay, G., Berthomieu, D., Goursot, A.
Elsevier
|
Gopalakrishnan, R., Davidson, J., Stafford, P., Hecker, W. C., Bartholomew, C. H.
American Chemical Society
|
Zhenguo Li, Johannes W. Schwank, Xiaoyin Chen, Junhua Li, Jiming Hao
American Institute of Chemical Engineers
|
Hultermans, R. J., Ito, E., Jozsef, A., Lugt, P. M., Bleek, C. M. van den
Elsevier
|
Feng Gao, Eric D. Walter, Nancy M. Washton, Janos Szanyi, Charles H.F. Peden
American Institute of Chemical Engineers
|
Beretta, A., Tronconi, E., Alemany, L. J., Svachula, J., Forzatti, P.
Elsevier
|
Iojoiu, E.E., Onu, P., Schmitzer, S., Weisweiler, W.
Elsevier
|
Mauvezin, M., Delahay, G., Coq, B., Kieger, S.
Elsevier
|
John R. Di Iorio, Ishant Khurana, W. Nicholas Delgass, Fabio H. Ribeiro, Jeffrey T. Miller
American Institute of Chemical Engineers
|