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Anisotropic etching of dielectrics exposed by high intensity femtosecond pulses

Author(s):
  • Juodkazis, S. ( CREST-JST (Japan) and Research Institute for Electronic Science. Hokkaido Univ. (Japan) )
  • Tabuchi, Y. ( The Univ. of Tokushima (Japan) )
  • Ebisui, T. ( The Univ. of Tokushima (Japan) )
  • Matsuo, S. ( The Univ. of Tokushima (Japan) )
  • Misawa, H. ( CREST-JST (Japan) and Research Institute for Electronic Science. Hokkaido Univ. (Japan) )
Publication title:
Advanced laser technologies 2004 : 10-15 September, 2004, Rome and Frascati, Italy
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5850
Pub. Year:
2004
Page(from):
59
Page(to):
66
Pages:
8
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819458476 [0819458473]
Language:
English
Call no.:
P63600/5850
Type:
Conference Proceedings

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