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CMOS degradation effects due to electron beam lithography in smart NEMS fabrication

Author(s):
Campabadal, F. ( Ctr. Nacional de Microelectronica (Spain) )
Ghatnekar-Nilsson, S. ( Lund Univ. (Sweden) )
Rius, G. ( Ctr. Nacional de Microelectronica (Spain) )
Fleta, C. ( Ctr. Nacional de Microelectronica (Spain) )
Raff, J. M. ( Ctr. Nacional de Microelectronica (Spain) )
Figueras, E. ( Ctr. Nacional de Microelectronica (Spain) )
Esteve, J. ( Ctr. Nacional de Microelectronica (Spain) )
2 more
Publication title:
Smart sensors, actuators, and MEMS II : 9-11 May 2005, Seville, Spain
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5836
Pub. Year:
2005
Page(from):
667
Page(to):
674
Pages:
8
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819458315 [0819458317]
Language:
English
Call no.:
P63600/5836
Type:
Conference Proceedings

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