Defect printability and inspectability of halftone masks for the 90nm and 70nm node

Defect printability and inspectability of halftone masks for the 90nm and 70nm node

Author(s):

Eggers, K. ( Infineon Technologies AG (Germany) )

Gutjahr, K. ( Infineon Technologies AG (Germany) )

Peikert, M. ( Infineon Technologies AG (Germany) )

Rutzinger, D. ( Infineon Technologies AG (Germany) )

Ludwig, R. ( Advanced Mask Technology Ctr. (Germany) )

Kaiser, M. ( Advanced Mask Technology Ctr. (Germany) )

Durr, A. ( Advanced Mask Technology Ctr. (Germany) )

Heumann, J. ( Advanced Mask Technology Ctr. (Germany) )

3 more

Publication title:

EMLC 2005 : 21st European Mask and Lithography Conference : 31 January-3 February, 2005, Dresden, Germany

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

5835

Pub. Year:

2005

Page(from):

273

Page(to):

281

Pages:

9

Pub. info.:

Bellingham, Wash.,: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819458308 [0819458309]

Language:

English

Call no.:

P63600/5835

Type:

Conference Proceedings

Details

TDL ID:	ZA00015067
Series ID:	PA00000029
Conf. info. (Name):	EMLC : European Mask and Lithography Conference
Conf. info. (Number):	2005 : 21st
Conf. info. (Venue):	Dresden, Germany
Conf. info. (Date):	2005.01.31-2005.02.03

Similar Items:

1 Conference Proceedings Inspectability and printability of lines and spaces halftone masks for the advanced DRAM node [6349-140] Durr, A. C., Gutjahr, K., Heumann, J., Stengl, M., Katzwinkel, F., Frangen, A., Witte, T. SPIE - The International Society of Optical Engineering	7 Conference Proceedings Limitations of optical reticle inspection for 45-nm node and beyond [6349-29] Teuber, S., Bzdurek, A., Durr, A. C., Heumann, J., Holfeld, C. SPIE - The International Society of Optical Engineering
2 Conference Proceedings Defect printability and inspectability of Cr-less phase-shift masks for the 70nm node J. Heumann, J. Schramm, A. Birnstein, K.T. Park, T. Witte, N. Morgana, M. Hennig, R. Pforr, J. Thiele, N. Schmidt, C. … SPIE - The International Society of Optical Engineering	8 Conference Proceedings EUVL defect printability at the 32-nm node Gullikson, E.M., Tejnil, E., Liang, T., Stivers, A.R. SPIE - The International Society of Optical Engineering
3 Conference Proceedings Defect printability study with programmed defects on halftone reticles Dettmann,W., Haffner,H., Heumann,J.P., Liebe,R., Ludwig,R., Moses,R. SPIE-The International Society for Optical Engineering	9 Conference Proceedings Deteclability and printability of EUVL mask blank defects for the 32-nm HP node W. Cho, H.-S. Han, K. A. Goldberg, P. A. Kearney, C.-U. Jeon Society of Photo-optical Instrumentation Engineers
4 Conference Proceedings Mask inspection challenges for 90- and 130-nm device technology nodes: inspection sensitivity and printability study using SEMI standard programmed defect masks Kim, W.D., Akima, S., Aquino, C.M., Becker, C., Eickhotf, M.D., Narita, T., Quah, S.-K., Rohr, P.M., Schlaffer, R., … SPIE-The International Society for Optical Engineering	10 Conference Proceedings Defect inspection and printability of deep-UV halftone phase-shifting mask Kim,H.-J., Hong,J.-S., Kye,J.-W., Cha,D.-H., Kang,H.-Y., Moon,J.-T. SPIE-The International Society for Optical Engineering
5 Conference Proceedings Correlating reticle pinhole defects to wafer printability for the 90-nm node lithography using advanced RET Shieh, W.B., Chou, W., Yang, C.-H., Wu, J.K., Chen, N., Yen, S.M., Hsu, T., Tuan, S., Chang, D., Rudzinski, M.W., Wang, … SPIE - The International Society of Optical Engineering	11 Conference Proceedings Alternating phase-shifting masks: phase determination and impact of quartz defects- theoretical and experimental results Griesinger, U.A., Dettmann, W., Hennig, M., Heumann, J.P., Koehle, R., Ludwig, R., Verbeek, M., Zarrabian, M. SPIE-The International Society for Optical Engineering
6 Conference Proceedings Investigation of quartz defect printability at the 65-nm node Poortinga, E.R., Taylor, D. SPIE - The International Society of Optical Engineering	12 Conference Proceedings Simulation of x-ray mask defect printability Bollepalli,B.S., Hector,S.D., Maldonado,J.R., Leavey,J.A., Cerrina,F., Khan,M. SPIE-The International Society for Optical Engineering

1

2

3

4

5

6

7

8

9

10

11

12