Results of a round robin measurement on a new CD mask standard
- Author(s):
Gans, F. ( Advanced Mask Technology Ctr. (Germany) ) Liebe, R. ( Advanced Mask Technology Ctr. (Germany) ) Richter, J. ( Advanced Mask Technology Ctr. (Germany) ) Schatz, Th. ( Infineon Technologies AG (Germany) ) Hauffe, B. ( Photronics MZD GmbH and Co. KG (Germany) ) Hillmann, F. ( MueTec GmbH (Germany) ) Dobereiner, S. ( MueTec GmbH (Germany) ) Bruck, H.-J. ( MueTec GmbH (Germany) ) Scheuring, G. ( MueTec GmbH (Germany) ) Brendel, B. ( Leica Microsystems Lithography GmbH (Germany) ) Bettin, L. ( Leica Microsystems Lithography GmbH (Germany) ) Roth, K.-D. ( Leica Microsystems Wetzlar GmbH (Germany) ) Steinberg, W. ( Leica Microsystems Wetzlar GmbH (Germany) ) Schluter, G. ( Leica Microsystems Wetzlar GmbH (Germany) ) Speckbacher, P. ( Dr. Johannes Heidenhain GmbH (Germany) ) Sedlmeier, W. ( Dr. Johannes Heidenhain GmbH (Germany) ) Scherubl, T. ( Carl Zeiss SMS GmbH (Germany) ) HaBler-Grohne, W. ( Physikalisch-Technische Bundesanstalt (Germany) ) Frase, C. G. ( Physikalisch-Technische Bundesanstalt (Germany) ) Czerkas, S. ( Physikalisch-Technische Bundesanstalt (Germany) ) Dirscherl, K. ( Physikalisch-Technische Bundesanstalt (Germany) ) Bodermann, B. ( Physikalisch-Technische Bundesanstalt (Germany) ) Mirande, W. ( Physikalisch-Technische Bundesanstalt (Germany) ) Bosse, H. ( Physikalisch-Technische Bundesanstalt (Germany) ) - Publication title:
- EMLC 2005 : 21st European Mask and Lithography Conference : 31 January-3 February, 2005, Dresden, Germany
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 5835
- Pub. Year:
- 2005
- Page(from):
- 122
- Page(to):
- 133
- Pages:
- 12
- Pub. info.:
- Bellingham, Wash.,: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819458308 [0819458309]
- Language:
- English
- Call no.:
- P63600/5835
- Type:
- Conference Proceedings
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