Blank Cover Image

The interaction of mask manufacturability and alt PSM design parameters

Author(s):
Publication title:
EMLC 2005 : 21st European Mask and Lithography Conference : 31 January-3 February, 2005, Dresden, Germany
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5835
Pub. Year:
2005
Page(from):
63
Page(to):
68
Pages:
6
Pub. info.:
Bellingham, Wash.,: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819458308 [0819458309]
Language:
English
Call no.:
P63600/5835
Type:
Conference Proceedings

Similar Items:

1 Conference Proceedings Reducing alternating phase shift mask (Alt-PSM) write-time through mask data optimization [5853-40]

Kasprowicz, B. S., van Adrichem, P. J. M., Chacko, M.

SPIE - The International Society of Optical Engineering
7 Conference Proceedings 65nm mask CD qualification on critical features through simulation based lithography verification [5853-132]

van Adrichem, P. J. M., Valadez, J., Ziger, D., Gerold, D.

SPIE - The International Society of Optical Engineering
2 Conference Proceedings A practical alternating PSM modeling and OPC approach to deal with 3D mask effects for the 65nm node and beyond [5992-66]

Drapeau, M., van Adrichem, P. J. M., van Look, L., Kasprowicz, B. S.

SPIE - The International Society of Optical Engineering
8 Conference Proceedings Specification of the phase angle of a 6% attenuated PSM mask used in ArF lithography

Chang, C.H., Schacht, J., Lin, B.S.-M, Hung, K.C., Huang, I.H.

SPIE - The International Society of Optical Engineering
3 Conference Proceedings An efficient resolution enhancement technique flow for 65nm logic poly layer [5853-96]

van Adrichem, P. J. M., Chacko, M., Kasprowicz, B. S.

SPIE - The International Society of Optical Engineering
9 Conference Proceedings Defect printability in CPL mask technology

Kuijten, J.-P., Verhappen, A., Pijnenburg, W., Conley, W., Litt, L.C., Wu, W., Montgomery, P., Roman, B.J., Kasprowicz, …

SPIE - The International Society of Optical Engineering
4 Conference Proceedings A 90-nm design-rule patterning application using alt-PSM with KrF lithography for volume manufacturing at k1=0.27

Majoni, S., Driessen, F.A., Kasprowicz, B.S., Harris, P.D.

SPIE - The International Society of Optical Engineering
10 Conference Proceedings Comparison of 2D measurement methodologies and their viability in a manufacturing environment

Kasprowicz,B.S., Taylor,D., Hathorn,M.E.

SPIE-The International Society for Optical Engineering
5 Conference Proceedings Fully automated CD: metrology and mask inspection in a mask production environment using the MueTec (M5k) DUV tool

Scheuring, G., Petrashenko, A., Doebereiner, S., Hillmann, F., Brucek, H.-J., Hourd, A.C., Grimshaw, A., Hughes, G., …

SPIE-The International Society for Optical Engineering
11 Conference Proceedings Layout-based manufacturability assessment and yield prediction methodology

Simon,P., Veelenturf,K., Adrichem,P.van, Jong,J.de, Sprij,S., Maly,W.P.

SPIE - The International Society for Optical Engineering
6 Conference Proceedings Manufacturing and inspection of OPC and PSM masks

Staud,W., Huang,K., Beard,P., Hebron,O., Eran,Y.

SPIE-The International Society for Optical Engineering
12 Conference Proceedings Design, mask, and manufacturability

Ma, M., Hong, H., Choi, Y. S., Ho, C. -C., Mason, M., McKee, R.

SPIE - The International Society of Optical Engineering
1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12