Application of PGSD (proximity gap suction development) to 70 nm NAND mask fabrication
- Author(s):
Sakurai, H. ( Toshiba Corp. (Japan) ) Shibata, T. ( Toshiba Corp. (Japan) ) Itoh, M. ( Toshiba Corp. (Japan) ) Ooishi, K. ( Tokyo Electron Kyushu Ltd. (Japan) ) Funakoshi, H. ( Tokyo Electron Kyushu Ltd. (Japan) ) Okamoto, Y. ( Tokyo Electron Kyushu Ltd. (Japan) ) Oono, S. ( Tokyo Electron Kyushu Ltd. (Japan) ) Kaneda, M. ( Tokyo Electron Kyushu Ltd. (Japan) ) Kamei, S. ( Tokyo Electron Kyushu Ltd. (Japan) ) Hayashi, N. ( Dai Nippon Printing Co., Ltd. (Japan) ) - Publication title:
- EMLC 2005 : 21st European Mask and Lithography Conference : 31 January-3 February, 2005, Dresden, Germany
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 5835
- Pub. Year:
- 2005
- Page(from):
- 29
- Page(to):
- 36
- Pages:
- 8
- Pub. info.:
- Bellingham, Wash.,: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819458308 [0819458309]
- Language:
- English
- Call no.:
- P63600/5835
- Type:
- Conference Proceedings
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