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20-nm linewidth nanoimprint mold prepared by selectively etched multiplayer thin film

Author(s):
Zhang, Y. ( Nanjing Univ. (China) and JiLin Normal Univ. (China) )
Han, G. ( Nanjing Univ. (China) )
Huang, X. ( Nanjing Univ. (China) )
Li, W. ( Nanjing Univ. (China) )
Hao, X. ( Nanjing Univ. (China) )
Ma, G. ( Nanjing Univ. (China) )
Chen, K. ( Nanjing Univ. (China) )
2 more
Publication title:
Fifth International Conference on Thin Film Physics and Applications : 31 May-2 June, 2004, Shanghai, China
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5774
Pub. Year:
2004
Page(from):
450
Page(to):
453
Pages:
4
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819457554 [0819457558]
Language:
English
Call no.:
P63600/5774
Type:
Conference Proceedings

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