Selective formation of porous silicon array using highly resistive silicon layer as masking materials
- Author(s):
- Publication title:
- Fifth International Conference on Thin Film Physics and Applications : 31 May-2 June, 2004, Shanghai, China
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 5774
- Pub. Year:
- 2004
- Page(from):
- 349
- Page(to):
- 352
- Pages:
- 4
- Pub. info.:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819457554 [0819457558]
- Language:
- English
- Call no.:
- P63600/5774
- Type:
- Conference Proceedings
Similar Items:
1
Conference Proceedings
Bond enhance of hydroxyapatite/silicon layers by introducing a porous silicon interlayer
SPIE - The International Society of Optical Engineering |
Electrochemical Society |
SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |
Society of Photo-optical Instrumentation Engineers |
SPIE-The International Society for Optical Engineering |
4
Conference Proceedings
Formation of single-crystal silicon layers on insulator islands using selective epitaxial growth and laser crystallization
Electrochemical Society |
10
Conference Proceedings
Formation of Micron Size Porous Silicon Patterns Using Selectively Doped Substrates
Narosa Publishing House |
SPIE - The International Society of Optical Engineering |
11
Conference Proceedings
Thick porous silicon sacrificial layer formation using implanted mask technology
SPIE-The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |
12
Conference Proceedings
Highly accurate calibration of optical radiation at infrared spectrum using thermopile 1S-76 [6150-85]
SPIE - The International Society of Optical Engineering |