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The studies of RT electrical resistivities of LaNiO3-s thin films by RF magnetron sputtering with different percentage of oxygen partial pressure at various substrate temperatures

Author(s):
Zhang, X. D. ( Shanghai Institute of Technical Physics, CAS (China) )
Meng, X. J. ( Shanghai Institute of Technical Physics, CAS (China) )
Sun, J. L. ( Shanghai Institute of Technical Physics, CAS (China) )
Wang, G. S. ( Shanghai Institute of Technical Physics, CAS (China) )
Lin, T. ( Shanghai Institute of Technical Physics, CAS (China) )
Chu, J. H. ( Shanghai Institute of Technical Physics, CAS (China) )
1 more
Publication title:
Fifth International Conference on Thin Film Physics and Applications : 31 May-2 June, 2004, Shanghai, China
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5774
Pub. Year:
2004
Page(from):
228
Page(to):
231
Pages:
4
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819457554 [0819457558]
Language:
English
Call no.:
P63600/5774
Type:
Conference Proceedings

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