Exploiting hierarchical structure to enhance cell-based RET with localized OPC reconfiguration

Exploiting hierarchical structure to enhance cell-based RET with localized OPC reconfiguration

Author(s):

Wang, X. ( Aprio Technologies(USA) )
Pillof, M. ( Aprio Technologies(USA) )
Tang, H. ( Aprio Technologies(USA) )
Wu, C. ( Aprio Technologies(USA) )

Publication title:

Design and process integration for microelectronic manufacturing III : 3-4 March 2005, San Jose, California, USA

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

5756

Pub. Year:

2005

Page(from):

361

Page(to):

367

Pages:

7

Pub. info.:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819457363 [0819457361]

Language:

English

Call no.:

P63600/5756

Type:

Conference Proceedings

Details

TDL ID:	ZA00014983
Series ID:	PA00000029
Conf. info. (Name):	SPIE Advanced Lithography : Data analysis and modeling for process control
Conf. info. (Number):	2005 : 3rd
Conf. info. (Venue):	San Jose, CA, USA
Conf. info. (Date):	2005.03.03-2005.03.04

Similar Items:

1 Conference Proceedings Enabling incremental RET to exploit hierarchical structure across multiple designs for sub- 100 nm lithography [5992-93] Laurance, M., Anderson, M., Pilloff, M. SPIE - The International Society of Optical Engineering	7 Conference Proceedings Correlating reticle pinhole defects to wafer printability for the 90-nm node lithography using advanced RET Shieh, W.B., Chou, W., Yang, C.-H., Wu, J.K., Chen, N., Yen, S.M., Hsu, T., Tuan, S., Chang, D., Rudzinski, M.W., Wang, … SPIE - The International Society of Optical Engineering
2 Conference Proceedings Increasing post OPC layout verification coverage using a full-chip simulation based verification method Hung, C.-Y., Wang, Y. D., Deng, Z. X., Gao, G. S., Fan, M. H. SPIE - The International Society of Optical Engineering	8 Conference Proceedings Patterning effect and correlated electrical model of post-OPC MOSFET devices Y. C. Cheng, T. H. Ou, M. H. Wu, W. L. Wang, J. H. Feng, W. C. Huang, C. M. Lai, R. G. Liu, Y. C. Ku SPIE - The International Society of Optical Engineering
3 Conference Proceedings RET integration of CPL technology for random logic Hsu, S.D., Van Den Broeke, D.J., Chen, J.F., Shi, X., Hsu, M., Laidig, T.L., Conley, W., Litt, L.C., Wu, W. SPIE - The International Society of Optical Engineering	9 Conference Proceedings Nanoparticles for Enhanced Sensitivity in Electrochemical Immunoassays Y. Lin, J. Wang, H. Wang, H. Wu, Z. Tang Electrochemical Society
4 Conference Proceedings Pattern centric OPC flow: a special RET flow with fast turn-around-time T. Wang, J. Wu, Q. Liu, G. Zhang, B. Wang Society of Photo-optical Instrumentation Engineers	10 Conference Proceedings Current Mapping of a Diagnostic Modeling Cell X. Yuan, E. Gu, C. Sun, H. Wang, J. Wu Electrochemical Society
5 Conference Proceedings Modeling polarized illumination for OPC/RET H. Song, Q. Zhang, J. Shiely Society of Photo-optical Instrumentation Engineers	11 Conference Proceedings Panchromatic ultra-fine-grain silver halide emulsions and their properties in reflection holography Wang, C., Pu, D.L., Zhu, T.C., Wu, J.H., Tang, M.X. SPIE-The International Society for Optical Engineering
6 Conference Proceedings Cell-based OPC with standard-cell fill insertion L. Deng, K.-Y. Chao, H. Xiang, M. D. F. Wong Society of Photo-optical Instrumentation Engineers	12 Conference Proceedings A subpixel localization method based on edge diffraction Y. Wang, M. Peng, X. Cheng Society of Photo-optical Instrumentation Engineers

1

2

3

4

5

6

7

8

9

10

11

12