Device and lithography contextual mask rule generation
- Author(s):
Ham, Y. M. ( Photronics, Inc. (USA) ) Dillon, B. ( HPL Technologies, Inc. (USA) ) Progler, C. ( Photronics, Inc. (USA) ) Goldammer, K. ( HPL Technologies, Inc. (USA) ) Jin, Z. ( HPL Technologies, Inc. (USA) ) Green, G. ( HPL Technologies, Inc. (USA) ) Mackay, R. S. ( Photronics, Inc. (USA) ) Divecha, H. ( HPL Technologies, Inc. (USA) ) Boksha, V. ( HPL Technologies, Inc. (USA) ) Martin, P. ( Photronics, Inc. (USA) ) Heins, M. ( HPL Technologies, Inc. (USA) ) Zhang, Y. ( Photronics, Inc. (USA) ) Davis, K. ( HPL Technologies, Inc. (USA) ) Marutyan, R. ( HPL Technologies, Inc. (USA) ) Martirosyan, K. ( HPL Technologies, Inc. (USA) ) Bakarian, S. ( HPL Technologies, Inc. (USA) ) - Publication title:
- Design and process integration for microelectronic manufacturing III : 3-4 March 2005, San Jose, California, USA
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 5756
- Pub. Year:
- 2005
- Page(from):
- 319
- Page(to):
- 330
- Pages:
- 12
- Pub. info.:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819457363 [0819457361]
- Language:
- English
- Call no.:
- P63600/5756
- Type:
- Conference Proceedings
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