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Mask cost analysis via write time estimation

Author(s):
Zhang, Y. ( Photronics, Inc. (USA) )
Gray, R. ( Photronics, Inc. (USA) )
Chou, S. ( Photronics, Inc. (USA) )
Rockwell, B. ( Photronics, Inc. (USA) )
Xiao, G. ( Photronics, Inc. (USA) )
Kamberian, H. ( Photronics, Inc. (USA) )
Cottle, R. ( Photronics, Inc. (USA) )
Wolleben, A. ( Photronics, Inc. (USA) )
Progler, C. ( Photronics, Inc. (USA) )
4 more
Publication title:
Design and process integration for microelectronic manufacturing III : 3-4 March 2005, San Jose, California, USA
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5756
Pub. Year:
2005
Page(from):
313
Page(to):
318
Pages:
6
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819457363 [0819457361]
Language:
English
Call no.:
P63600/5756
Type:
Conference Proceedings

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