DFM in practice: results of a three way partnership between a leading fabless design house, foundry, and EDA company to implement alternating-phase shift mask(Alt-PSM) on a 90-nm FPGA chip
- Author(s):
Yu, C. -C. ( UMC(Taiwan) ) Shieh, M. -F. ( UMC(Taiwan) ) Liu, E. ( UMC(Taiwan) ) Lin, B. ( UMC(Taiwan) ) Lin, H. ( Synopsys Inc. (USA) ) Chacko, M. ( Synopsys Inc. (USA) ) Li, X. ( Synopsys Inc. (USA) ) Lei, W. -K. ( Synopsys Inc. (USA) ) Ho, J. ( Xilinx Inc. (USA) ) Wu, X. ( Xilinx Inc. (USA) ) - Publication title:
- Design and process integration for microelectronic manufacturing III : 3-4 March 2005, San Jose, California, USA
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 5756
- Pub. Year:
- 2005
- Page(from):
- 262
- Page(to):
- 273
- Pages:
- 12
- Pub. info.:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819457363 [0819457361]
- Language:
- English
- Call no.:
- P63600/5756
- Type:
- Conference Proceedings
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