Advanced timing analysis based on post-OPC patterning process simulations

Advanced timing analysis based on post-OPC patterning process simulations

Author(s):

Yang, J. ( Univ. of Michigan(USA), Advanced Micro Devices(USA) )
Capodieci, L. ( Advanced Micro Devices(USA) )
Sylvester, D. ( Univ. of Michigan(USA) )

Publication title:

Design and process integration for microelectronic manufacturing III : 3-4 March 2005, San Jose, California, USA

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

5756

Pub. Year:

2005

Page(from):

189

Page(to):

197

Pages:

9

Pub. info.:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819457363 [0819457361]

Language:

English

Call no.:

P63600/5756

Type:

Conference Proceedings

Details

TDL ID:	ZA00014983
Series ID:	PA00000029
Conf. info. (Name):	SPIE Advanced Lithography : Data analysis and modeling for process control
Conf. info. (Number):	2005 : 3rd
Conf. info. (Venue):	San Jose, CA, USA
Conf. info. (Date):	2005.03.03-2005.03.04

Similar Items:

1 Conference Proceedings Layout verification and optimization based on flexible design rules [6156-09] Yang, J., Capodieci, L., Sylvester, D. SPIE - The International Society of Optical Engineering	7 Conference Proceedings In-tool process control for advanced patterning based on integrated metrology Mui, D.S.L., Sasano, H., Liu, W., Yamartino, J., Skumanich, A. SPIE - The International Society of Optical Engineering
2 Conference Proceedings DRC Plus: augmenting standard DRC with pattern matching on 2D geometries V. Dai, J. Yang, N. Rodriguez, L. Capodieci SPIE - The International Society of Optical Engineering	8 Conference Proceedings Self-compensating design for reduction of timing and leakage sensitivity to systematic pattern dependent variation [6156-10] Gupta, P., Kahng, A. B., Kim, Y., Sylvester, D. SPIE - The International Society of Optical Engineering
3 Conference Proceedings Simulation based post OPC verification to enhance process window critical failure analysis and yield [6154-137] Kang, J. H., Chol, J. Y., Yun, K.H., Do, M., Lee, Y.S., Kim, K. SPIE - The International Society of Optical Engineering	9 Conference Proceedings Patterning effect and correlated electrical model of post-OPC MOSFET devices Y. C. Cheng, T. H. Ou, M. H. Wu, W. L. Wang, J. H. Feng, W. C. Huang, C. M. Lai, R. G. Liu, Y. C. Ku SPIE - The International Society of Optical Engineering
4 Conference Proceedings Subresolution process windows and yield estimation technique based on detailed full-chip CD simulation Granik,Yu., Cobb,N.B., Sahouria,E.Y., Toublan,O., Capodieci,L., Socha,R.J. SPIE-The International Society for Optical Engineering	10 Conference Proceedings Adjustment of optical proximity correction (OPC) software for mask process correction (MPC): Module 2. Lithography simulation based on optical mask writing tool … Barberet, A., Buck, P.D., Fanget, G.L., Toublan, O., Richoilley, J.-C., Tissier, M. SPIE-The International Society for Optical Engineering
5 Conference Proceedings Design-driven metrology: a new paradigm for DFM-enabled process characterization and control, extensibility, and limitations (Invited Paper) [6152-01] Capodieci, L. SPIE - The International Society of Optical Engineering	11 Conference Proceedings Advanced DFM applications using design-based metrology on CD SEM [6152-194] Lorusso, G. F., Capodieci, L., Stoler, D., Schulz, B., Roling, S., Schramm, J., Tabery, C., Shah, K., Singh, B., Abbott, … SPIE - The International Society of Optical Engineering
6 Conference Proceedings Contrast-based assist feature optimization Torres, J.A., Granik, Y., Capodieci, L. SPIE-The International Society for Optical Engineering	12 Conference Proceedings Die-to-die and die-to-database capability analysis for advanced OPC inspection Chen,J.X., Russell,D.R., Terhune,R., Riddick,J., Kalk,F.D., Lucas,K.D., Falch,B.J. SPIE - The International Society for Optical Engineering

1

2

3

4

5

6

7

8

9

10

11

12