Modeling within-field gate length spatial variation for process-design co-optimization

Modeling within-field gate length spatial variation for process-design co-optimization

Author(s):

Friedberg, P. ( Univ. of California/Berkeley(USA) )

Cao, Y. ( Univ. of California/Berkeley(USA) )

Cain, J. ( Univ. of California/Berkeley(USA) )

Wang, R. ( Univ. of California/Berkeley(USA) )

Rabaey, J. ( Univ. of California/Berkeley(USA) )

Spanos, C. ( Univ. of California/Berkeley(USA) )

1 more

Publication title:

Design and process integration for microelectronic manufacturing III : 3-4 March 2005, San Jose, California, USA

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

5756

Pub. Year:

2005

Page(from):

178

Page(to):

188

Pages:

11

Pub. info.:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819457363 [0819457361]

Language:

English

Call no.:

P63600/5756

Type:

Conference Proceedings

Details

TDL ID:	ZA00014983
Series ID:	PA00000029
Conf. info. (Name):	SPIE Advanced Lithography : Data analysis and modeling for process control
Conf. info. (Number):	2005 : 3rd
Conf. info. (Venue):	San Jose, CA, USA
Conf. info. (Date):	2005.03.03-2005.03.04

Similar Items:

1 Conference Proceedings Spatial modeling of micron-scale gate length variation [6155-10] Friedberg, P., Cheung, W., Spanos, C. J. SPIE - The International Society of Optical Engineering	7 Conference Proceedings BEOL process technology based on proximity electron lithography: demonstration of the via-chain yield comparable with ArF lithography Cain, J. P., Naulleau, P., Spanos, C. J. SPIE - The International Society of Optical Engineering
2 Conference Proceedings Modeling spatial gate length variation in the 0.2μm to 1.15mm separation range P. Friedberg, W. Cheung, G. Cheng, Q. Y. Tang, C. J. Spanos SPIE - The International Society of Optical Engineering	8 Conference Proceedings Layout optimization based on a generalized process variability model Q. Y. Tang, C. J. Spanos Society of Photo-optical Instrumentation Engineers
3 Conference Proceedings Circuit size optimization with multiple sources of variation and position dependant correlation Q. Y. Tang, P. Friedberg, G. Cheng, C. J. Spanos SPIE - The International Society of Optical Engineering	9 Conference Proceedings A comprehensive model of process variability for statistical timing optimization K. Qian, C. J. Spanos Society of Photo-optical Instrumentation Engineers
4 Conference Proceedings Optimum sampling for characterization of systematic variation in photolithography Cain, J.P., Zhang, H., Spanos, C.J. SPIE-The International Society for Optical Engineering	10 Conference Proceedings Time-based PEB adjustment for optimizing CD distributions Friedberg, P.D., Tang, C., Singh, B., Brueckner, T., Gruendke, W., Schulz, B., Spanos, C.J. SPIE - The International Society of Optical Engineering
5 Conference Proceedings Electrical linewidth metrology for systematic CD variation characterization and causal analysis Cain, J.P., Spanos, C.J. SPIE-The International Society for Optical Engineering	11 Conference Proceedings Collaborative platform, tool-kit, and physical models for DfM A. Neureuther, W. Poppe, J. Holwill, E. Chin, L. Wang, J. Yang, M. Miller, D. Ceperley, C. Clifford, K. Kikuchi, J. … SPIE - The International Society of Optical Engineering
6 Conference Proceedings Resist sensitivity and thickness-based beam count optimization for parallel low energy E-beam exposure systems Cain, J. P., Naulleau, P., Spanos, C. J. SPIE - The International Society of Optical Engineering	12 Conference Proceedings Substrate smoothing for high-temperature condenser operation in EUVL source environments Cain, J. P., Naulleau, P., Spanos, C. J. SPIE - The International Society of Optical Engineering

1

2

3

4

5

6

7

8

9

10

11

12