Optical extensions integration for a 0.314-μm2 45-nm node 6-transistor SRAM cell

Optical extensions integration for a 0.314-μm2 45-nm node 6-transistor SRAM cell

Author(s):

Verhaegen, S. ( IMEC vzw(Belgium) )
Nackaerts, A. ( IMEC vzw(Belgium) )
Wiaux, V. ( IMEC vzw(Belgium) )
Hendrickx, E. ( IMEC vzw(Belgium) )
Vandenberghe, G. ( IMEC vzw(Belgium) )

Publication title:

Design and process integration for microelectronic manufacturing III : 3-4 March 2005, San Jose, California, USA

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

5756

Pub. date:

2005

Page(from):

120

Page(to):

130

Pages:

11

Pub. info.:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819457363 [0819457361]

Language:

English

Call no.:

P63600/5756

Type:

Conference Proceedings

Details

TDL ID:	ZA00014983
Series ID:	PA00000029
Conf. info. (Name):	SPIE Advanced Lithography : Data analysis and modeling for process control
Conf. info. (Number):	2005 : 3rd
Conf. info. (Venue):	San Jose, CA, USA
Conf. info. (Date):	2005.03.03-2005.03.04

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